OFFER DEADLINE31/07/2018 17:00 - Europe/Brussels
EU RESEARCH FRAMEWORK PROGRAMMEH2020 / Marie Skłodowska-Curie Actions
LOCATIONSpain, 28049 Madrid
ORGANISATION/COMPANYFundación IMDEA Nanociencia
The group of Nano-engineering at IMDEA Nanociencia led by Dr. Feng Luo, Senior Research Prof., is looking for expressions of interests from potential postdoctoral researchers wishing to apply for a Marie Sklodowka Individual European Fellowship.
- Micro/Nano Fabrication and Ultra-Precision Manufacturing for Applications in Magnetic Hard Disk Storage, Magnetic Random Access Memory (MRAM) and Magneto-Optical Sensors,
- Tuning Physical Properties by Design and Controlling: Interface Engineering at Atomic Scale and Lithography Patterning,
- Advanced Characterization Techniques Based on X-ray and Electrons.
Bit patterned magnetic nanostructures by DNA nanolithograhy for ultra high density magnetic recording media
Mass data storage on magnetic hard drives in portable products is a big market with an estimated turnover of several billion EUR/year. Significant efforts have been devoted to the development of techniques that further increase the areal density of information in magnetic hard disk drives and magnetic random access memory (MRAM). However, the relevant roadmaps indicate that the required lithography tools will not be able to provide the required feature size, performance and cost efficiency in time for media density beyond 1 Tbit/in2.This project addresses the key challenges of magnetic media, targeting the potential for the ultimate frontier of magnetic data storage, where a single bit is supported by the smallest magnetic islands with a thermally stable magnetisation. The vision of this project is to achieve and combine breakthroughs that will create a new technology for bit patterned magnetic nanostructures based on DNA lithography and DNA molds casting. Isolated magentic islands will be either patterned by DNA direct nanolithographic techniques combined with manetic metal tilt deposition or casting FePt nanoparticles with DNA molds to form ordered magnetic nanostructures. Statistic and dynamic magnetic switching properties of the media will be characterized by different techniques such as magnetic force microscopy (MFM), magneto-optical Kerr effect (MOKE) and scanning transmission x-ray microscopy (STXM). In addition, the recording performance will be investigated by AFM probe recording. Prerequisite for achieving the above technological goal is not only the final performance in practical technological applications, but also an improved understanding of magnetic phenomena at the nanoscale, which is the intrinsic scientific content and objective of the project.
Dr. Feng Luo has published 46 publications with “h” index of 18 and total citations more than 1750 times and average citations per article is around 34 in international peer review journals of high impact factor such as Phys. Rev. Lett.(2), J. Am. Chem. Soc.(1), Chem. Phys. Lett.(3), Appl. Phys. Lett.(8), J. Mater. Chem.(2), J. Appl. Phys.(3)., Nanoscale (2), Adv. Optical. Mater.(1), Phys. Rev. B (1) and Angew. Chem. Int. Ed.(1). He is the referee of grant proposal for M-era foundation (http://www.m-era.net/) from 2013. Regarding dissemination of results at international events he has 21 contributions as presenting author in well-established international conferences. He has given 15 invited seminars in different European research institutions and universities in Europe and China. He has been involved in 20 research projects and 10 projects as PI. These projects are now funded with the total budget of 1.15 Million Euro as the principal investigator.
Candidates are invited to submit their Expression of Interest to Prof. Feng Luo (firstname.lastname@example.org) with subject MSCA-IF 2018 by the 31th of July 2018. The Expression of Interest should include a complete and updated CV with a brief description of the previous research and a motivation letter in ONE PDF file only.
The responsibility for the hosting offers published on this website, including the hosting description, lies entirely with the publishing institutions. The application is handled uniquely by the employer, who is also fully responsible for the recruitment and selection processes.